1/27/2022 | 2903490000 | INDUSTRIAL GAS TETRAFLUOROMETHANE (HLADON 14, R14) - FULLY FLUORINED DERIVATIVE OF SATURATED ACYCLIC HYDROCARBON METHANE. USED IN THE MANUFACTURE OF MICROELECTRONICS. | 1536 | 29754.6 | Germany | UNTERSCHLEISSHEIM GERMANY | ASTOR JSC |
1/27/2022 | 2903490000 | INDUSTRIAL GAS OCTAFLUOROPROPANE (HLADON 218, R218) - FULLY FLUORINED DERIVATIVE OF SATURATED ACYCLIC HYDROCARBONS PROPANE. USED IN THE MANUFACTURE OF MICROELECTRONICS. | 1880 | 78153.9 | Germany | UNTERSCHLEISSHEIM GERMANY | ASTOR JSC |
1/20/2022 | 2903490000 | INDUSTRIAL GAS - TETRAFLUOROMETHANE (HLADONE 14, R14) FULLY FLUORINED DERIVATIVE OF SATURATED ACYCLIC HYDROCARBONS PROPANE. USED IN THE MANUFACTURE OF MICROELECTRONICS. | 2688 | 71273.1 | France | CHALON SUR SAONE FRANCE | ASTOR JSC |
1/14/2022 | 2903590000 | INDUSTRIAL GAS 1,3-HEXAFLUOROBUTADIENE - FLUORINATED UNSATURATED HYDROCARBONS (MAINTAIN MATERIAL CONTENT 99.95%) CHEMICAL FORMULA C4F6, CAS No. 685-63-2, USED IN THE MANUFACTURE OF MICROELECTRONICS, | 6000 | 1314552.6 | Japan | YOKOGAMA PORT OF JAPAN | ASTOR JSC |
1/12/2022 | 2903590000 | INDUSTRIAL GAS 1,3-HEXAFLUOROBUTADIENE - FLUORINATED UNSATURATED HYDROCARBON (MAIN MATERIAL CONTENT 99.98%) CHEMICAL FORMULA C4F6, CAS No. 685-63-2, USED IN THE MANUFACTURE OF MICROELECTRONICS, | 6485 | 1166753.4 | Japan | G P KUZMOLOVSKY | ASTOR JSC |
1/28/2022 | 2903590000 | INDUSTRIAL GAS 1,3-HEXAFLUOROBUTADIENE - FLUORINATED UNSATURATED HYDROCARBON (MAIN MATERIAL CONTENT 99.98%) CHEMICAL FORMULA C4F6, CAS No. 685-63-2, USED IN THE MANUFACTURE OF MICROELECTRONICS, | 6000 | 1079244 | South Korea | BUSAN | ASTOR JSC |
1/11/2022 | 2903590000 | INDUSTRIAL GAS 1,3-HEXAFLUOROBUTADIENE - FLUORINATED UNSATURATED HYDROCARBONS (MAINTAIN CONTENT 99.98%) CHEMICAL FORMULA C4F6, CAS No. 685-63-2, USED IN MICROELECTRONICS PRODUCTION, | 6000 | 1079242.3 | South Korea | BUSAN | ASTOR JSC |